As a professional manufacturer of Dry Etcher which is equipment for front-end process of semiconductor, VM holds original technologies related to semiconductor equipment production.

We manufacture Dry Etcher System for mass production with independent technologies. Our plasma technology, is fundamentally applied to the production of dry etcher system for 300mm Wafer, superseding foreign-made equipment thanks to great competitive edge in both performance and price.

Moreover, our innovative plasma technology can be applied to a variety of plasma process equipment including the CVD (Chemical Vapor Deposition) necessary for semiconductor fabrication process as well as the next-generation dry etch sector.